"The emergence of innovative products in the semiconductor industry"

"ASML takes the lead in developing EUV lithography machine"

"Chip process may be improved tenfold"

"Chip technology has reached physical limits"

While there were still hot spots like "magic" and "alien creatures", ASML's EUV lithography machine immediately became a global hot spot thanks to the operation of a group of capital behind it.

Normally, the updates and iterations of a product are traceable, or there will be technical reserves.

For example, the EUV lithography machine is obviously a newly opened track and has little to do with the previous DUV lithography machine. However, in the parallel world, it is forced to wait until the chip reaches the 7nm bottleneck that is the limit of the DUV lithography machine before it is released.

But here, because of the pressure brought by Umbrella DUV lithography machines, the prospects of artificial intelligence and quantum computing and supercomputing models are here.

In order to compete for this cutting-edge profit again, for a better prospect.

When today's top chip process was still 14nm, ASML launched their EUV lithography machine.

It is said that it can solve the tunneling problem, and even go higher!

"Ambre is so evil and insidious. He has been covering it up or letting it go, but he just came out when he was short of the final word."

That was a weak opponent, but we still lost, lost to you!

Or just rely on technical differences to complete the crushing in one go!

But now, under the pressure from Calcai's side, both Ambrey and the small fabs have shown their best potential, working overtime and all working together.

At the same time, there are many semiconductor engineers from Semiconductor Manufacturing Co., Ltd., Seven Star, Intel, etc., as well as professionals from chip design factories, packaging factories, etc.

"But, you are weaker..."

They are metal droplets dropped by bombardment. They are completely the same without any mistakes in all aspects.

The hype fueled by various capital sources, coupled with the new sanctions against Calcaila, made many people anxious.

As the discussion on the Internet fermented, when the popularity reached its peak, Ambrey also canceled a live broadcast.

As the camera zoomed out, the companies that Xiang Qihou and Zhu Shao were involved in EUV component design, including representatives from the eight small EDA factories, chip design factories, and crystal original factories, were all in the same frame.

They are making enemies of the world...

“Perhaps from the very beginning, some people were dissatisfied with the EUV lithography machine, because although in theory it can achieve ten times the resolution of the DUV lithography machine, it is too difficult, the difficulty is too small, and there are too few bottlenecks that need to be overcome.

The need for technology is extremely low, and the number of difficulties to overcome is a win.”

It shows our huge confidence and strength.

When you are chasing after him, you will continue to move forward, always walking behind, building many barriers to block his way, so that you will always maintain a gap!

Immediately afterwards, the representative of Ambre introduced our EUV light source.

The ASMAX engineer also stood up and said politely.

That in itself is also an expression of showing off your muscles!

That time, I’m afraid it wasn’t Karcai La who was targeted!

Because only by not showing the weakness of Calcai La can we prove that we are weaker!

Let you always occupy the smallest profit!

But there is a way. Carl Caila's attack is too weak, the performance of our DUV lithography machine is too bad, and the chip is simply not in a white box state and can be fully understood.

In that case, they can only bring out the worst in one fell swoop and knock us down directly.

After the live broadcast, Ambre’s engineer took the lead in introducing the

After saying that, he made a gesture of invitation to the engineer of Xiang Qihou Company next to him.

"Everyone knows that the essence of a lithography machine is not exposure. For a DUV lithography machine, you can also find corresponding lenses that allow deep ultraviolet rays to pass through. They are usually new lenses produced by Carl Zeira's technology, and even more so.

If it is weaker than that, Carl Caila’s own photolithography machine will not take advantage of that point to overtake in corners, but it will exceed your efficiency in terms of using the infiltration method!”

Even the vehicles used to transport lithography machines are the patented technology of a certain Semiconductor Manufacturing Company!

While talking, we walked around the factory building.

The beautiful light source technology, the neon light source conversion equipment, the low-lying valves, the Prussian lenses, and the Swedish bearings all need to be extremely precise. If one is missing, the installation must be extremely precise and avoid the influence of the surrounding environment.

Micro vibration.

You have the weakest technologies in the world.

Ambre did not belittle Xiang Qihoula, or even brag about it.

After the live broadcast, few viewers could see clearly what the problem was.

Yes, that is in line with business laws and profits.

"I said later that extreme violet rays need to be reflected more than a dozen times to achieve your effect, and due to the ionization consumption of extreme violet rays, about 30% of the energy will be lost in each reflection. In the end, you will be unable to use it effectively.

The amount of light is only about 2%. Therefore, you need a light source with sufficient and stable output power. In order to overcome this problem, Cymer spent a full ten years to overcome it, but after eight years, Cymer has not yet

The acquisition was completed by your company..."

"I am afraid that few people have thought that you would directly abandon the original mature DUV technology and start developing EUV lithography machines from scratch."

"However, that is true for EUV lithography machines. The 13.5nm wavelength extreme ultraviolet ionization capability you use is extremely weak. There are lenses that are not suitable for that kind of precision to allow the low-energy beam to pass through, so the only option is not

The only way is without reflection!"

A total of more than a dozen reflections are required to achieve the final exposure requirement!

However, the theoretical limit of the EUV lithography machine is to reach the limit of silicon-based chips, which cannot reach 1nm!

And those top giants did not gather together to suppress Carl Caila Company.

Obviously, ASML's EUV lithography machine was not said to have been built just now. It was not officially announced until the supply was completed and we had to work overtime to complete the assembly.

This chapter is not finished yet, please click on the next page to continue reading the exciting content! No matter how weak Calcai La’s artificial intelligence is, it still needs to rely on hardware!

Today, the mainstream chip technology has only reached 14nm.

As I said that, I continued to put the holographic screen in. Even the principle was revealed outside. Instead of using low-energy lasers, I bombarded liquid metal droplets intermittently. The difficulty and accuracy made people's heads tingle just by looking at the data I provided.

"Calcai La's company is very weak, very weak, so weak that it is breathtaking. The holographic technology you are showing now, the weakened coating under your lenses, the structure without artificial intelligence, etc., have all laid the foundation for Cal Cela's weakness.

Base.

"That's not your EUV lithography machine. Although it has only been installed and debugged in various small wafer factories now, how to improve the process to the limit depends on the methods of each small wafer factory, but your tools are not bad yet.

The production is completed, and it is not gone yet. It is a condition to learn from experience through trial and error. It cannot be a step back, but a step back...

EUV lithography machines are much smaller than DUVs, weighing 180 tons. Even transportation requires special vehicles, and assembly is quite troublesome.

The reason why I made that live broadcast was not to announce it to everyone.

While talking, I opened the bracelet, forming an eight-dimensional holographic projection and giving a complicated introduction.

It is not about continuously using the reflection of some lenses to complete the convergence of extreme ultraviolet rays.

"Bad little move!"

We have the world's top technology.

EUV lithography machine is definitely a matter of two technologies, but it brings together the most advanced technologies in the world.

"You have also made use of Carl Caila's technical coating. Of course, you are not confident in terms of accuracy..."

As he spoke, the holographic image also underwent regression and changes, and a brief summary of the principles was explained.

And because of Umbrella's influence and blessing on the lens field, there is also a sense of competition brought about by other technologies.

"..."

Following the previous introduction, the audience also understood how the machine was put together to become a monster.

He may be able to break through a certain bottleneck in the short term, but he can't break through all bottlenecks!

The EUV lithography machine that ASML brought out in advance this time is even better than the originally planned technical parameters!

Although the chip has been overdrawn to the limit, it cannot make up for it in terms of quantum computing, supercomputing and artificial intelligence!

It can be said that the delay is due to the lack of training for the staff of the cooperative wafer fabs. If the installation and debugging is completed from scratch, it will be quite easy to say that it will take only half a year.

————

"The precision requirements for reflective lenses cannot be said to be extremely low. I would like to thank ASMAX for its efforts in that aspect."

It's just difficult to manufacture, but to maintain a stable and long-lasting light source without enough output power, it is necessary to ensure that each impact is extremely precise and the frequency must be low enough.

"Afterwards, I felt that World Corporation was not very unjust, but compared to what was done to Carl Caila, it was terrifying!"

Is there any quick update and iteration to harvest the regression?

The purpose is not to get it right in one step, not to increase the reaction time for competitors!

Semiconductor Semiconductor Manufacturing Co., Ltd., Four Star, Intel and other fabs have all arrived and started assembly and debugging!

That kind of technical accumulation is something he can't catch up with in a short time!

"World Corporation was only incidentally affected, and the main target was Carl Zeilan. It is because our interests are too small."

Now, Ambrey isn't out there playing cards.

Standing in a factory building, everyone had smiles on their faces.
Chapter completed!